Photoresist Stripper and Cleaning Materials Market - Forecast (2024-2030)

The photoresist stripper and cleaning materials market size is forecast to reach USD 3,700 million by 2029, after growing at a CAGR of 7.2% during 2024-2029. The market for Photoresist Strippers and Cleaning Materials is crucial to the semiconductor production process. Photoresists are crucial materials used in photolithography, a critical stage in semiconductor production that involves transferring patterns onto silicon wafers to construct integrated circuits and other electronic components. These photoresists must be removed after processing, which is where strippers and cleaning agents come into play. The growing use of electronic gadgets in a variety of industries, including smartphones, automotive electronics, and IoT devices, is pushing up demand for semiconductors. This, in turn, increases the demand for Photoresist Strippers and Cleaning Materials, which are critical components in semiconductor manufacturing.  

Semiconductor producers are always pushing the limits of technology by moving to smaller semiconductor nodes such as 7nm, 5nm, and even below. As feature sizes decrease, the photolithography process becomes increasingly complicated and demanding. Advanced photoresist materials with precise chemical characteristics are required to create the necessary patterns on silicon wafers. Furthermore, extremely effective strippers and cleaning solutions are required to remove the photoresist residue without damaging the sensitive semiconductor structures. Photoresist Stripper and Cleaning Materials are critical to the performance of advanced node semiconductor manufacturing processes at companies like TSMC (Taiwan Semiconductor Manufacturing Company) and Intel.

The report “Photoresist stripper and cleaning materials Market– Forecast (2024-2029)”, by IndustryARC, covers an in-depth analysis of the following segments of the photoresist stripper and cleaning materials market.

By Product: Aqueous, Semi-Aqueous

By Process: Positive Photoresist (PR) Strippers, Negative Photoresist (PR) Strippers

By Cleaning Technique: Etch, Wet Clean, Strip

By Cleaning Materials: Semi-Aqueous Cleaning Materials, Aqueous Cleaning Materials

By Application: Wafer-Level Packaging, Integrated Circuit Manufacturing, LED / OLED, Memory, Foundry, IDM

By Geography:  North America, South America, Europe, Asia-Pacific, RoW

• Photoresist Stripper and Cleaning Materials are critical components in advanced node semiconductor production processes that require precision and efficiency. In its foundry business, Samsung Electronics relies on innovative photoresist strippers and cleaning agents to make high-performance semiconductor chips at cutting-edge nodes such as 5nm and below. These materials maintain the integrity and quality of the semiconductor manufacturing process, allowing for the production of next-generation electronic devices.

• Photoresist Stripper and Cleaning Materials are critical for driving innovation in developing technologies like artificial intelligence (AI), self-driving cars, and 5G connectivity. As a leader in 5G technology, semiconductor companies such as Qualcomm rely on improved photoresist materials and cleaning agents to produce highly integrated and efficient 5G modems and radio frequency circuits. These materials enable the exact patterning and cleaning operations required for the manufacture of dependable and high-performance semiconductor components that power next-generation communications systems.

• The Asia-Pacific area, particularly Taiwan, South Korea, and China, is experiencing rapid expansion in semiconductor production. Taiwan, for example, is home to major semiconductor foundries such as TSMC and UMC, which are expanding manufacturing capacity to fulfill the world's growing demand for semiconductors. As a result, demand for Photoresist Stripper and Cleaning Materials is increasing significantly in this region, with major providers including JSR Corporation and Tokyo Ohka Kogyo (TOK).

In comparison to semi-aqueous solutions, aqueous-based photoresist strippers and cleaning materials have dominated the market. A variety of variables contribute to its supremacy. Environmental Issues and Regulatory Compliance: Aqueous solutions are generally favored because they have a smaller environmental impact than semi-aqueous alternatives, which may contain volatile organic compounds (VOCs) or other dangerous substances. With rising restrictions and environmental awareness, semiconductor makers are turning to greener, more sustainable alternatives. Companies such as Samsung Electronics, for example, have committed to decreasing their environmental impact by implementing cleaner manufacturing processes and selecting aqueous-based cleaning solutions in order to comply with severe laws. 

Aqueous-based cleaning solutions are very effective and compatible with a wide variety of semiconductor materials and procedures. They may successfully remove photoresist residues and impurities without causing damage to sensitive semiconductor structures or jeopardizing device performance. Aqueous solutions are the preferred choice for essential semiconductor production processes due to their stability and compatibility. For example, SK Hynix, a leading memory chip maker, uses aqueous-based cleaning solutions to assure the quality and dependability of their semiconductor devices.

Negative photoresist (PR) strippers dominated the photoresist stripper and cleaning materials market in 2023. This dominance is primarily due to the widespread use of negative photoresists in advanced semiconductor manufacturing processes. For example, there is an increasing need for advanced semiconductor nodes like 7nm and down, which frequently require negative photoresists for patterning procedures. In high-resolution applications, negative photoresists have various advantages over positive photoresists, including increased etch selectivity, resolution capabilities, and line edge roughness control. 

As semiconductor manufacturers continue to push the boundaries of miniaturization and complexity in chip designs, the demand for negative photoresists and strippers is projected to stay high. Furthermore, negative photoresists are preferred in upcoming technologies such as EUV lithography, where fine control over feature size and pattern fidelity is required. As EUV lithography becomes increasingly common in semiconductor manufacturing, the demand for negative photoresists and suitable strippers is expected to rise further.

Gap Fillers dominated the photoresist stripper and cleaning materials market in 2023. Gap fillers are a key part of heat management for electronic equipment. Gap fillers are designed to bridge tiny or large gaps between heat-generating and heat-dissipating surfaces. Gap fillers operate by filling air gaps with a thermally conductive substance, which prevents the air from acting as an insulator around heat-generating elements. For example, these materials can cover gaps ranging from tiny (as little as 0.001" or 0.25mm) to 0.400" or 10mm or larger.

Eliminating these spaces improves heat transfer and prevents overheating, which can damage components and reduce performance. Gap fillers are used in automotive electronics to increase thermal performance and long-term dependability in engine control units (ECUs), advanced drive assistance systems (ADAS) modules, and battery management systems (BMSs). As a result, in the photoresist stripper and cleaning materials market, gap fillers are predicted to hold the largest market due to their versatility, effectiveness, and wide-ranging applications in numerous sectors.

Wet Cleaning dominated the photoresist stripper and cleaning materials market in 2023. Wet cleaning involves the use of chemical solutions to remove impurities from semiconductor surfaces. It is a popular and adaptable cleaning procedure because it effectively removes a wide range of residues, particles, and pollutants. Wet cleaning can be customized to meet specific process needs, making it appropriate for a variety of applications. This approach is very popular because of its ability to attain high cleanliness levels, which are critical for assuring the durability and performance of semiconductor devices.

Tokyo Electron Limited (TEL), a leading producer of semiconductor equipment, provides sophisticated wet cleaning solutions that are adapted to the changing needs of semiconductor manufacturers. TEL's wet cleaning systems use revolutionary technology to offer greater cleaning performance while using less water and chemicals, matching with industry trends toward sustainability and resource efficiency. This emphasizes the importance of wet cleaning as the main cleaning approach in semiconductor manufacturing, which is supported by continued improvements by important industry participants like as TEL.

Integrated Circuit Manufacturing dominated the photoresist stripper and cleaning materials market in 2023. Semiconductor chips are widely used in a variety of electronic gadgets. Integrated circuits are critical components of electronic devices such as smartphones, laptops, automotive electronics, and IoT devices, resulting in high demand for semiconductor production techniques and materials. 

The development ambitions of major semiconductor foundries such as Taiwan Semiconductor Manufacturing Company (TSMC). TSMC is a major player in integrated circuit manufacturing, renowned for its innovative semiconductor fabrication techniques. TSMC announced plans to develop new semiconductor fabs and expand current ones in response to rising demand for sophisticated processors. As a result, demand for Photoresist Stripper and Cleaning Materials, which are critical components in semiconductor manufacturing, is predicted to rise, cementing Integrated Circuit Manufacturing's market supremacy.

Asia Pacific dominated the photoresist stripper and cleaning materials market in 2023. Many prominent players in the Photoresist Stripper and Cleaning Materials market, notably in Asia-Pacific, make significant investments in research and development (R&D) to create innovative solutions that are customized to the changing needs of semiconductor manufacturers. This emphasis on innovation allows enterprises in the region to stay ahead of the competition and secure a sizable market share. JSR Corporation, a Japanese chemical business, is a major player in the global market for photoresist strippers and cleaning materials. JSR has a significant presence in the Asia-Pacific area, with production and research facilities strategically positioned in Japan, Singapore, and China. The company works closely with semiconductor manufacturers in the region to develop new photoresist and cleaning solutions adapted to their individual needs, which contributes to its leading position.

The ongoing advancement of semiconductor manufacturing processes increases the requirement for improved Photoresist Stripper and Cleaning Materials. Technological improvements, such as the move to smaller semiconductor nodes and the use of novel materials and structures, necessitate innovations in photoresist stripping and cleaning methods. "With the increasing adoption of EUV lithography technology in semiconductor manufacturing, there's a growing need for advanced photoresist strippers capable of efficiently removing highly sensitive photoresist materials used in the process," says a spokesperson from a leading semiconductor equipment manufacturer.

The global expansion of semiconductor production facilities, driven by rising demand for electronic products and innovative technologies, boosts demand for Photoresist Stripper and Cleaning Materials. Semiconductor manufacturers are establishing new fabrication facilities or expanding existing ones to suit rising market demand, notably in Asia-Pacific. Merck Group, a global leader in semiconductor materials, recently announced plans to increase photoresist and associated material production capacity in Asia-Pacific. The company is investing in new production facilities and R&D centers to meet the region's expanding demand for sophisticated semiconductor materials. Furthermore, governments in Taiwan and South Korea offer incentives and support to semiconductor companies looking to expand their manufacturing processes, which drives up demand for Photoresist Stripper and Cleaning Materials.

Stringent environmental rules governing the use and disposal of chemicals in semiconductor manufacturing processes present hurdles to the Photoresist Stripper and Cleaning Materials market. Companies must comply with regulations governing chemical emissions, waste disposal, and worker safety, which can have an impact on materials selection and development. Companies such as Tokyo Ohka Kogyo (TOK) are actively creating environmentally friendly photoresist and cleaning products. TOK has introduced products with low environmental effect, such as low-VOC (volatile organic compound) solvents and bio-based cleaning agents. Furthermore, governments in Europe and California have launched initiatives to encourage the use of environmentally friendly chemicals in manufacturing processes, offering incentives for businesses to adopt sustainable practices.

As semiconductor manufacturing processes become more sophisticated and demanding, there is a greater demand for photoresist strippers and cleaning agents that fulfill strict performance standards. This includes the ability to remove photoresist residue effectively while avoiding harm to fragile semiconductor structures and maintaining high degrees of cleanliness. Meeting these performance requirements necessitates ongoing innovation and technological improvements in photoresist stripping and cleaning solutions. Companies must invest in R&D to improve their products' efficiency, precision, and dependability, addressing issues such pattern collapse, line edge roughness, and contamination. Dow Electronic Materials, a Dow Inc. subsidiary, has invested in the development of improved photoresist strippers and cleaning agents to meet technological complexity concerns.

Technology launches, acquisitions, and R&D activities are key strategies adopted by players in the photoresist stripper and cleaning materials market. Major players in the photoresist stripper and cleaning materials market are Tokyo Ohka Kogyo (TOK), JSR Corporation, Merck Group, Shin-Etsu Chemical Co., Ltd., DuPont de Nemours, Inc., Fujifilm Corporation, Dow Chemical Company, Sumitomo Chemical Co., Ltd., Avantor, Inc., and Shin-Nakamura Chemical Co., Ltd. among others.

In January 2024, TOK announced the launch of a new environmentally friendly photoresist stripper optimized for advanced semiconductor manufacturing processes. The stripper offers improved performance and reduced environmental impact compared to conventional formulations.

In March 2023, JSR Corporation unveiled a new generation of cleaning materials specifically designed for EUV lithography applications. These cleaning materials are engineered to remove tough residues while minimizing damage to delicate semiconductor structures, thereby improving yield and process reliability.

In October 2022, Merck Group inaugurated a state-of-the-art manufacturing facility for photoresists and related materials in Shanghai, China. The facility is equipped with advanced production capabilities and quality control systems to meet the growing demand for semiconductor materials in the Asia-Pacific region.